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Seminar of Inst. NanoEngineering and MicroSystems, December 19, 2016

奈米工程與微系統研究所 書報討論

Seminar of Inst. NanoEngineering and MicroSystems

 

教授

Yeu-Chung Lin

Visiting Scholar, National Taiwan University

 

STT MRAM and its impact to semiconductor industry

 

 

Abstract

 

Both standalone and embedded STT MRAM are demonstrated recently and may enter into mass production in 2017. Standalone STT MRAM may be applied to systems which require high write speed, low power consumption and non-volatility; embedded STT MRAM will emerge as a replacement of embedded flash first and eventually take place of cache of different levels in future process nodes. Either SOT or VCMA is required to further improve the power consumption and write speed performance. 3D structure of MTJ is also demanded to meet the requirement of scalability. The allocation between research and development deserves a rethinking.

 

 

 

 

20161219(週一)15301720,工程一館108

15:30-17:20 on Dec. 19 (Mon), 2016 in Room 108 of Eng. Building I

 

 

 

Contact: Wei-Chih Wang (03-5742488)

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